Electron and hole injection barriers between silicon substrate and RF magnetron sputtered In2O3 : Er films
Konstantin V. Feklistov, Aleksey G. Lemzyakov, Alexander A. Shklyaev, Dmitry Yu. Protasov, Alexander S. Deryabin, Evgeny V. Spesivsev, Dmitry V. Gulyaev, Alexey M. Pugachev, Dmitriy G. Esaev